R10 is the newest addition to RHK's long line of breakthrough SPM Control systems. R10 is RHK’s tenth generation SPM control system, built on thier industry-leading knowledge and experience extending back over more than 30 years.
R10 is the latest advance in the continuing evolution of the R-Series Family of Controllers. With its fresh, forward-looking emphasis on Modularity as its guiding principle, R10 presents a new Design Ethos to the world-wide SPM research community. RHK’s unique Design Ethos brings practical adaptability and confident configurability to the forefront.
Files
| Attachment | Size |
|---|---|
 Brochure Controller SPM RHK R10 | 7.12 MB |
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With an eye for the newest capabilities and advances in electronics, RHK R&D recognized they could create a new, superior path. This brought far-reaching improvements to their new R10 software, firmware, and hardware, without limiting or sacrificing any aspect of Controller performance. With its optimized modular architecture, R10 further improves on controller capabilities and brings users forward to the best solutions.
RHK also dismissed the tired solution of yet-another-box for every function. To put it succinctly, the option of a meter-tall stack of unwieldy box-after-box-after-box, along with their jungle of cables, failed to meet their own performance demands and forward-looking Design Ethos.
In keeping with their fresh Design Ethos of optimized Modularity, RHK designed the new R10 as an elegant 1 or 2-box solution. R10 provides a separate unit for High Voltage Amplifiers if required, and a main unit for easy advancements by users themselves via firmware activation and quick-and-easy internal hardware plug-in modules to our unique backplane.
Thanks to RHK’s unique, simple-yet-sophisticated Modularity, you can depend on RHK for highly customized upgrades to pioneer your research into new fields.
RHK’s R10 Design Ethos of Optimized Modularity goes much deeper than RHK's uniquely configurable hardware and software elements. Modularity is built into the very core of R10, including new, breakthrough choices of how you acquire it.
R10 Modularity frees users from future risks of obsolescence or insufficient capability to achieve their research goals. It gives users the ability to make advanced choices with fresh confidence. R10 empowers you with the freedom to tackle daunting new challenges a step at a time and within budgetary constraints.
R10 Software Subscription enables you to purchase the software you need and pay for it over an extended timeframe.
R10 Rent-a-Feature enables you to “Try Before You Buy” for real-world confidence and proof about your upgrade decisions
High Voltage Amplifiers: R10’s modular flexibility provides three choices regarding HVAs. If your SPM system does not require High Voltage Amplifiers, then you can opt out and avoid an unnecessary cost. If you do need a set of HVAs, you can simply purchase and plug them in.
- Future-Proof
- Obsolescence-Proof
- Feature-Proof
- Application-Proof
- Scanning Tunneling Microscopy (STM) - Topography | Current
- Modulated STM STS Spectroscopy - I[V] | dl/dV | d2l/dV2 | dl/dZ | Hyperspectral Mapping
- Contact AFM - Topography | Lateral Force [LFM] | Conductive [C-AFM] | Spreading Resistance Imaging | Force Modulation (FMM]
- Intermittent Contact AFM - Amplitude | Phase | Drive | Pogo
- Amplitude Modulation AFM - Topography | Phase | Feedback
- Magnetic Force Microscopy (MFM] Electrostatic Force Microscopy (EFM] - Two-pass DC/AC | Lift DC/AC | Single-pass, | Two-pass | Amplitude Modulation | Frequency Modulation
- Kelvin Probe Force Microscopy (KPFM] - Single-pass, Two-pass | Amplitude Modulation | Phase Modulation | Frequency Modulation | dC/dZ imaging | dC/dV imaging
- Piezo-response Force Microscopy (PFM] - Voltage | Current | Force
- Frequency Modulation AFM - qPlus® | Shear Force [SFM] | Cantilever | Tuning Fork | df | Dissipation
- Scanning Capacitance Microscopy (SCM)
- Scanning Thermal Microscopy (SThM]
- Multi-frequency AFM
- Scattering Scanning Near-field Optical Microscopy (sSNOM]
- AFM Spectroscopy - Force-distance | Amplitude-distance | Phase/ distance | I[V] | Hyperspectral mapping | df/Z❘ drive/Z
- Nanolithography - Bias or Force controlled patterning | User defined patterning Patterns and coordinates saved and loaded from standard file